ELECTRICAL RESISTIVITY CHANGES IN THIN METALLIC FILMS DUE TO ION IRRADIATION
- 1 February 1967
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 10 (3) , 91-92
- https://doi.org/10.1063/1.1754865
Abstract
The change in electrical resistance of thin Ag, Au, Ti, and W films was studied following energetic A+ ion bombardment. There is an initial reduction in film resistance (for all materials) during bombardment, which is attributed to removal of surface contaminant gas. The resistance then increases to a quasiequilibrium value, which is believed to be due to introduction of radiation damage to the films, and finally the resistance increases rapidly as the films sputter and thin.Keywords
This publication has 1 reference indexed in Scilit:
- RESISTIVITY OF THIN SILVER LAYERS DURING HEAVY-ION IRRADIATIONApplied Physics Letters, 1966