1 keV hydrogen implantation in a-Si and c-Si: Physical vs computational modeling
- 1 July 1996
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 115 (1) , 468-472
- https://doi.org/10.1016/0168-583x(95)01525-6
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Computer studies of the reflection of light ions from solidsPublished by Elsevier ,2002
- Crystal-trim and its application to investigations on channeling effects during ion implantationRadiation Effects and Defects in Solids, 1994
- Experiments and simulations on the effect of channeling on the ranges of 1 keV deuterons in siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
- Electron desorption study of HF etched Si(100)Journal of Vacuum Science & Technology A, 1993
- Depth-profiling of hydrogen and helium isotopes by means of the ERD E × B techniqueNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992
- Structural relaxation and defect annihilation in pure amorphous siliconPhysical Review B, 1991
- A quantitative investigation of hydrogen in the metal-oxide-silicon system using NRAIEEE Transactions on Nuclear Science, 1990
- Slowing-down time of energetic atoms in solidsPhysical Review B, 1989
- Dual ion implantation technique for formation of shallow p+/n junctions in siliconJournal of Applied Physics, 1983
- Energy Dissipation by Ions in the kev RegionPhysical Review B, 1961