The growth of boron films by physical vapour deposition
- 30 September 1979
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 67 (1) , 79-83
- https://doi.org/10.1016/0022-5088(79)90076-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Structure and property relationships of Ni−20Cr produced by high−rate physical vapor depositionJournal of Vacuum Science and Technology, 1975
- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972
- The Influence of Ion Bombardment on the Microstructure of Thick Deposits Produced by High Rate Physical Vapor Deposition ProcessesJournal of Vacuum Science and Technology, 1972
- Structure Modification by Ion Bombardment during DepositionJournal of Vacuum Science and Technology, 1972