Sputter deposition of dense diamond-like carbon films at low temperature
- 4 February 1991
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 58 (5) , 466-468
- https://doi.org/10.1063/1.104609
Abstract
Thin carbon films were deposited by ion beam sputtering at temperatures of 77–1073 K. Using Rutherford backscattering spectrometry and electron energy loss spectroscopy, the trends in film density and bonding were examined as a function of deposition conditions. It has been found that film density and sp3 bonding character unexpectedly increased with increased substrate thermal conductivity and decreasing substrate temperature, reaching values of 2.9 g/cc and 50%, respectively.Keywords
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