Initial nucleation of a-Si:H: An in situ ellipsometry study of the effect of deposition procedure
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 269-272
- https://doi.org/10.1016/0022-3093(87)90064-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- I n s i t u investigation of the growth of rf glow-discharge deposited amorphous germanium and silicon filmsJournal of Applied Physics, 1987
- Film formation mechanisms in the plasma deposition of hydrogenated amorphous siliconJournal of Applied Physics, 1986
- Optical properties of thin filmsThin Solid Films, 1982