Investigation of the chemical properties of stain films on silicon by means of infrared spectroscopy
- 31 October 1965
- journal article
- Published by Elsevier in Surface Science
- Vol. 3 (4) , 314-332
- https://doi.org/10.1016/0039-6028(65)90002-6
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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