Prediction of in-plane distortions due to mask fabrication processes
- 1 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 549-552
- https://doi.org/10.1016/s0167-9317(96)00154-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress EffectJapanese Journal of Applied Physics, 1996
- Modeling of in-plane distortions due to variations in absorber stressMicroelectronic Engineering, 1996