Measurement of Metallic Film Densities by an Optical Technique
- 1 August 1965
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 36 (8) , 2377-2381
- https://doi.org/10.1063/1.1714494
Abstract
Densities of metal films were measured using multiple beam interferometry in combination with an oscillating crystal microbalance. Film densities of Al, Au, Ag, Cr, and Cu were found to be independent of thickness within experimental accuracy of about 5% in the thickness range from 200 to 5000 Å for fixed deposition conditions. Measurements indicate that film densities were equal to bulk densities within measurement accuracy for Al, Au, Ag, and Cu for deposition at about 10−6 Torr. The film density of Cr was found to be strongly dependent on oxygen partial pressure above 10−6 Torr, decreasing sharply as the oxygen partial pressure increased. The effect of condensation coefficients of metal films on the optical measurements is discussed.This publication has 4 references indexed in Scilit:
- Density Measurements of Some Thin Copper FilmsJournal of Applied Physics, 1959
- Verwendung von Schwingquarzen zur W gung d nner Schichten und zur Mikrow gungThe European Physical Journal A, 1959
- Apparent Density of Thin Evaporated FilmsJournal of Applied Physics, 1954
- The Thickness Measurement of Thin Films by Multiple Beam InterferometryJournal of Applied Physics, 1950