Deposition of Titanilum Nitride Thin Films by Plasma Enhanced CVD and Reactive Sputtering
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
Titanium nitride films were deposited from TiCl4 /NH3 mixtures in a rf glow discharge.The deposition was carried o t at pressures between 0.1 and 0.7 Torr, RF powers of 0.1 to 1.1 watt/cm2, and temperatures between 400°C and 600°C.The films deposited at 600°C had low chlorine content and resistivities in the range of 100 to 200 μΩ-cm.Films deposited at temperatures below 500°C contained large amounts of chlorine (> 15 at %) and showed poor electrical properties.The films were further characterized by Rutherford Backscattering Spectroscopy (RBS), X-ray Photoelectron Spectroscopy (XPS), and Auger Electron Spectroscopy (AES).The effect of plasma parameters on the deposition rate and film properties is discussed.Comparisons to films prepared by reactive sputtering of titanium in a nitrogen atmosphere are presented.Keywords
This publication has 11 references indexed in Scilit:
- Summary Abstract: Reactively sputtered TiN, ZrN, and HfNJournal of Vacuum Science & Technology A, 1985
- Partial pressure control of reactively sputtered titanium nitrideJournal of Vacuum Science & Technology A, 1985
- Growth and properties of single crystal TiN films deposited by reactive magnetron sputteringJournal of Vacuum Science & Technology A, 1985
- Adhesion of titanium nitride coatings on high-speed steelsJournal of Vacuum Science & Technology A, 1985
- Plasma chemical vapor deposition of TiNPlasma Chemistry and Plasma Processing, 1984
- Structural properties of titanium dioxide films deposited in an rf glow dischargeJournal of Vacuum Science & Technology A, 1983
- Color of titanium nitride prepared by reactive dc magnetron sputteringJournal of Vacuum Science and Technology, 1982
- Optical properties of TiNx produced by reactive evaporation and reactive ion-beam sputteringVacuum, 1982
- Properties of TiNxfilms reactively sputtered in an argon-nitrogen atmosphereThin Solid Films, 1979
- Magnetron dc reactive sputtering of titanium nitride and indium–tin oxideJournal of Vacuum Science and Technology, 1977