Photoirradiation Effect on Photoluminescence from Anodized Porous Silicons and Luminescence Mechanism
- 1 April 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (4B) , L494-497
- https://doi.org/10.1143/jjap.31.l494
Abstract
The photoirradiation effect on photoluminescence (PL) from anodized porous silicons was studied. Although PL from Si anodized in artificial light decreased with photoirradiation, PL from Si anodized in the dark was found to increase with photoirradiation in air. The main factor for the photoirradiation effect was attributed to oxidation in the surface layer by transmission infrared spectroscopy. During the temporal spectral change in the Si samples anodized in the dark, discrete PL peaks were observed. These PL peaks were excellently modeled by a quantum size effect. The observed blue shift of the PL spectra is interpreted to be due to the reduction of the microparticle size in the topmost amorphous layer with oxidation.Keywords
This publication has 10 references indexed in Scilit:
- Intense photoluminescence from laterally anodized porous SiApplied Physics Letters, 1991
- Thermal treatment studies of the photoluminescence intensity of porous siliconApplied Physics Letters, 1991
- Electroluminescence in the visible range during anodic oxidation of porous silicon filmsApplied Physics Letters, 1991
- Efficient Visible Photoluminescence from Porous SiliconJapanese Journal of Applied Physics, 1991
- Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafersApplied Physics Letters, 1990
- Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphologyJournal of Vacuum Science & Technology A, 1989
- Three-Dimensional Quantum Well Effects in Ultrafine Silicon ParticlesJapanese Journal of Applied Physics, 1988
- Quantum size effects on the optical band gap of microcrystalline Si:HPhysical Review B, 1988
- Initial Oxidation Process of Anodized Porous Silicon with Hydrogen Atoms Chemisorbed on the Inner SurfaceJapanese Journal of Applied Physics, 1988
- Hydrogen desorption kinetics from monohydride and dihydride species on silicon surfacesPhysical Review B, 1988