Fabrication of 100nm-period gratings using achromatic holographic lithography
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 201-205
- https://doi.org/10.1016/0167-9317(90)90098-e
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Magneto-optics of a quasi-zero-dimensional electron gasApplied Physics Letters, 1989
- Lateral-surface-superlattice and quasi-one-dimensional GaAs/GaAlAs modulation-doped field-effect transistors fabricated using x-ray and deep- ultraviolet lithographyJournal of Vacuum Science & Technology B, 1988
- Achromatic holographic lithography in the deep ultravioletJournal of Vacuum Science & Technology B, 1988
- An improved technique for resist-profile control in holographic lithographyJournal of Vacuum Science & Technology B, 1983