Structure and defect characterization of epitaxial CoSi2 on Si(001) formed using an amorphous Co75W25 sputtered layer
- 1 September 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (5) , 1807-1814
- https://doi.org/10.1116/1.586482
Abstract
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