Method for reducing hyperbolic phase in interference lithography
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6) , 2347-2352
- https://doi.org/10.1116/1.1421558
Abstract
A new method is proposed for correcting nonlinear spatial phase in gratings produced with spherical beam interference lithography. We suggest that a concave exposure surface can be used to compensate for the variations in interference angle and fringe inclination which lead to hyperbolic phase progression on a flat exposure plane. Experiments are shown using a spherical concave exposure surface that demonstrate the validity of the method.Keywords
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