Azide–novolak resin negative photoresist for i-line phase-shifting lithography

• 1 November 1991
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 9  (6) , 3162-3165
• https://doi.org/10.1116/1.585309

Abstract