Controlled oxidation of tantalum and aluminium in a radio-frequency-excited glow discharge
- 1 September 1967
- journal article
- Published by IOP Publishing in British Journal of Applied Physics
- Vol. 18 (9) , 1337-1339
- https://doi.org/10.1088/0508-3443/18/9/418
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Plasma Anodized Aluminum Oxide FilmsJournal of the Electrochemical Society, 1964
- The Formation of Metal Oxide Films Using Gaseous and Solid ElectrolytesJournal of the Electrochemical Society, 1963
- Heat-Treatment of Anodic Oxide Films on TantalumJournal of the Electrochemical Society, 1963
- The determination of the thickness, dielectric constant, and other properties of anodic oxide films on tantalum from the interference coloursProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1958
- Recherches électronographiques sur les pellicules d’oxydes apparaissant sur l’aluminium et le nickel dans une décharge électrique en milieu gazeux d’oxygèneJournal de Chimie Physique et de Physico-Chimie Biologique, 1957