Growth of HgBa2Ca2Cu3O8 thin films using stable Re0.1Ba2Ca2Cu3Ox precursor by pulsed laser deposition
- 15 July 1998
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 73 (3) , 381-383
- https://doi.org/10.1063/1.121841
Abstract
High quality c-axis oriented thin films have been fabricated with the stable Re-doped precursor powder by pulsed laser deposition followed by postannealing without any special handling. As-grown films on (100) exhibit a zero-resistance transition at ∼131 K with a narrow transition width after oxygen annealing at 340 °C for 12 h. The critical current densities are observed at 10 K and at 120 K in zero field. The x-ray diffraction pattern indicates highly c-axis oriented thin films normal to the substrate plane containing a minor phase. The scanning electron microscopy analysis shows that the surface morphology of the film is well connected platelike crystals but reveals impurities are uniformly scattered across the film surface.
Keywords
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