A Commercially Viable 193 nm Single Layer Resist Platform.

• 1 January 1997
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 10  (3) , 511-520
• https://doi.org/10.2494/photopolymer.10.511

Abstract

Keywords

• NM SINGLE
• RESIST PLATFORM
• LAYER RESIST
• COMMERCIALLY VIABLE
• SINGLE LAYER