Technical note: Comparison of film density, stoichiometry, optical and electrical properties of thin metal oxide films produced by reactive d.c. magnetron sputtering and electron beam evaporation techniques
- 31 December 1987
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 33, 393-400
- https://doi.org/10.1016/0257-8972(87)90204-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Electrical and optical properties of thin Ta and W oxide films produced by reactive direct current magnetron sputteringJournal of Vacuum Science & Technology A, 1987
- Inversion of normal-incidence (R,T) measurements to obtain n + ik for thin filmsApplied Optics, 1986