X-ray exposure characteristics of diazo-type photoresist using synchrotron radiation
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 4 (4) , 251-267
- https://doi.org/10.1016/0167-9317(86)90017-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Exposure Characteristics Of Electron Beam Resists For Synchrotron X-Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1983
- Conventional novolak resists for storage ring x-ray lithographyJournal of Vacuum Science & Technology B, 1983
- Photochemical Decomposition Mechanisms for AZ-Type PhotoresistsIBM Journal of Research and Development, 1979
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975