Microscopic mechanism for mechanical polishing of diamond (110) surfaces

Preprint

24 March 1998

preprint
Published by arXiv in arXiv

https://doi.org/10.48550/arXiv.cond-mat/9803289

Abstract

Mechanically induced degradation of diamond, as occurs during polishing, is studied using total--energy pseudopotential calculations. The strong asymmetry in the rate of polishing between different directions on the diamond (110) surface is explained in terms of an atomistic mechanism for nano--groove formation. The post--polishing surface morphology and the nature of the polishing residue predicted by this mechanism are consistent with experimental evidence.

Keywords

MICROSCOPIC MECHANISM
SURFACES MECHANICALLY
MECHANICAL POLISHING
MORPHOLOGY
PREDICTED
POLISHING
ASYMMETRY
ATOMISTIC
DIAMOND

All Related Versions

Version 1, 1998-03-24, ArXiv
Published version: Physical Review Letters, 80 (16), 3428.

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