Dynamics of laser-induced vaporization for ultrafast deposition of amorphous silicon films
- 1 March 1981
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 38 (5) , 385-387
- https://doi.org/10.1063/1.92347
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Time dependence of the reflectivity of Si at 633 and 488 nm during pulsed laser annealingApplied Physics Letters, 1980
- Order-Disorder Transition in Single-Crystal Silicon Induced by Pulsed uv Laser IrradiationPhysical Review Letters, 1979
- Laser Annealing of Ion-Implanted SemiconductorsScience, 1979
- A spectroscopic study on the evaporation of aluminum as irradiated by a long-pulse Nd laserJournal of Applied Physics, 1977
- System for rapid injection of metal atoms into plasmasReview of Scientific Instruments, 1975
- Laser-generated pulsed atomic beamsReview of Scientific Instruments, 1974