Etching Characteristics of Silicon and its Compounds by Gas Plasma

• 1 January 1973
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 12  (1) , 154-155
• https://doi.org/10.1143/jjap.12.154

Abstract

Keywords

• ETCHING CHARACTERISTICS
• GAS PLASMA
• CHARACTERISTICS OF SILICON
• COMPOUNDS BY GAS