Measurement of complex optical constants of a highly doped Si wafer using terahertz ellipsometry
- 10 December 2001
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 79 (24) , 3917-3919
- https://doi.org/10.1063/1.1426258
Abstract
We propose and demonstrate a terahertz (THz) time-domain spectroscopy combined with ellipsometry. The complex optical constants of a Si wafer with low resistivity are deduced from the measurements of the wave forms of reflected s- and p-polarized THz pulses without reference measurement. The obtained dispersion of refractive index above shows good agreement with that predicted by the Drude theory. The complex optical constants deduced by the THz ellipsometry in the low-frequency region are strongly affected by the slight error of the ellipsometric angle originating mainly from the misalignment of the rotation angles of the polarizer and analyzer.
Keywords
This publication has 5 references indexed in Scilit:
- Measurement of optical properties of highly doped silicon by terahertz time domain reflection spectroscopyApplied Physics Letters, 2001
- Time-domain dielectric constant measurement of thin film in GHz–THz frequency range near the Brewster angleApplied Physics Letters, 1999
- Characterization of optically dense, doped semiconductors by reflection THz time domain spectroscopyApplied Physics Letters, 1998
- Transient terahertz reflection spectroscopy of undoped InSb from 0.1 to 1.1 THzApplied Physics Letters, 1996
- Microwave Conductivity of Silicon and GermaniumJournal of Applied Physics, 1968