Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering
- 15 February 1985
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 24 (4) , 490-495
- https://doi.org/10.1364/ao.24.000490
Abstract
Ion-beam sputter deposition of tantalum oxide films was investigated for possible optical coating applications. Optical properties of such films were found to be a sensitive function of oxygen-to-argon ratio in the ion beam. Refractive index and absorption coefficient were determined in the 250–2000-nm wavelength range by spectrophotometric transmissivity. The different bonding states of the tantalum atoms were revealed by x-ray photoelectron spectroscopy. The visible wavelength refractive index was found to be 2.18 and optical band gap 4.3 eV, so long as the films did not contain inclusions of metallic tantalum. Films with an admixture of oxygen deficient suboxide components had a low-energy tail of increasing magnitude in the absorption spectrum.Keywords
This publication has 12 references indexed in Scilit:
- Ion Beam Sputter Deposition Of Optical CoatingsOptical Engineering, 1983
- Sputtered Ta2O5 antireflection coatings for silicon solar cellsThin Solid Films, 1982
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- Effects of deposition parameters on optical loss for rf-sputtered Ta2O5 and Si3N4 waveguidesJournal of Vacuum Science and Technology, 1979
- The optical properties of thin films of tantalum pentoxide and zirconium dioxideThin Solid Films, 1975
- Losses in tantalum pentoxide waveguidesJournal of Electronic Materials, 1974
- Effect of pressure on the properties of reactively sputtered Ta2O5Journal of Vacuum Science and Technology, 1974
- Light Waves in Thin Films and Integrated OpticsApplied Optics, 1971
- `Anodic Oxidation of TantalumCanadian Journal of Physics, 1971
- The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of SolidsPhysical Review B, 1953