Index of Refraction of Tantalum Oxide in the Wavelength Interval 2750-14000 Å
- 6 December 1975
- journal article
- research article
- Published by Taylor & Francis in Optica Acta: International Journal of Optics
- Vol. 22 (12) , 973-979
- https://doi.org/10.1080/713818999
Abstract
The dispersion curve for the index of refraction of anodically formed Ta2O5 thin films has been obtained from the interference minima of the reflection spectrum in the region 2750-14000 Å. The dependence on the wavelength may be expressed as n λ = 1·85 + 1671/(λ−903). The change of phase which takes place upon reflection is also obtained.Keywords
This publication has 4 references indexed in Scilit:
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- The kinetics of formation and structure of anodic oxide films on tantalumActa Metallurgica, 1953