On the Thermodynamic Stability of Amorphous Intergranular Films in Covalent Materials
- 1 March 1997
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 80 (3) , 717-732
- https://doi.org/10.1111/j.1151-2916.1997.tb02889.x
Abstract
No abstract availableKeywords
This publication has 33 references indexed in Scilit:
- Atomic modes of dislocation mobility in siliconPhilosophical Magazine A, 1995
- Structural, electronic, and vibrational properties of liquid and amorphous silicon: Tight-binding molecular-dynamics approachPhysical Review B, 1994
- Structure-energy correlation for grain boundaries in F.C.C. metals—III. Symmetrical tilt boundariesActa Metallurgica et Materialia, 1990
- Structure-energy correlation for grain boundaries in siliconPhilosophical Magazine A, 1989
- Molecular-dynamics method for the simulation of bulk-solid interfaces at high temperaturesPhysical Review B, 1988
- Amorphous-silicon formation by rapid quenching: A molecular-dynamics studyPhysical Review B, 1987
- Phase diagram of silicon by molecular dynamicsPhysical Review B, 1987
- Fragmentation of silicon microclusters: A molecular-dynamics studyPhysical Review B, 1987
- Structure of Amorphous Silicon and Silicon HydridesPhysical Review Letters, 1980
- Dislocation Models of Crystal Grain BoundariesPhysical Review B, 1950