Oxygen RIE‐Resistant Deep‐UV Positive Resists: Poly (trimethylsilylmethyl methacrylate) and Poly (trimethylsilylmethyl methacrylate‐co‐3‐oximo‐2‐butanone methacrylate)
- 1 May 1985
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 132 (5) , 1178-1182
- https://doi.org/10.1149/1.2114054
Abstract
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