Plasma etching of polysilicon/nitride/polysilicon sandwich structure for sensor applications
- 1 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4) , 341-344
- https://doi.org/10.1016/0167-9317(93)90087-l
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Design considerations for a permanent-rotor-charge-excited micromotor with an electrostatic bearingSensors and Actuators A: Physical, 1991
- Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmasJournal of Applied Physics, 1978
- Profile control by reactive sputter etchingJournal of Vacuum Science and Technology, 1978