Determination of deposition velocity onto a wafer for particles in the size range between 0.03 and 0.8 μm
- 1 January 1989
- journal article
- Published by Elsevier in Journal of Aerosol Science
- Vol. 20 (7) , 787-796
- https://doi.org/10.1016/0021-8502(89)90090-6
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology (C-62550692)
This publication has 5 references indexed in Scilit:
- The effects of electrostatic and inertial forces on the diffusive deposition of small particles onto large disks: Viscous axisymmetric stagnation point flow approximationsJournal of Aerosol Science, 1989
- Particle Deposition on Semiconductor WafersAerosol Science and Technology, 1987
- Local and Average Heat Transfer Characteristics for a Disk Situated Perpendicular to a Uniform FlowJournal of Heat Transfer, 1985
- Determination of Particle Size Distribution of Ultra-Fine Aerosols Using a Differential Mobility AnalyzerAerosol Science and Technology, 1985
- A direct method for studying particle deposition onto solid surfacesColloid and Polymer Science, 1983