Pulse–time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching
- 1 November 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 14 (6) , 3049-3058
- https://doi.org/10.1116/1.580170
Abstract
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