Simulating IC reliability with emphasis on process-flaw related early failures

• 1 January 1995
• journal article
• Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Reliability
• Vol. 44  (4) , 556-561
• https://doi.org/10.1109/24.475973

Abstract

Keywords

• RELIABILITY
• PROCESS FLAWS
• SIMULATOR
• INTEGRATED CIRCUITS
• MASK LAYOUT
• MONTE CARLO
• VIAS
• METAL RUNS