Diffusion in Ni/Cu bilayer films
- 13 April 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 60 (15) , 1824-1826
- https://doi.org/10.1063/1.107176
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Cu deposition on rough ceramic substrate: Physical structure, microstructure, and resistivityJournal of Materials Research, 1991
- A high ionization efficiency source for partially ionized beam depositionJournal of Vacuum Science & Technology A, 1988
- Diffusion barriers in thin filmsThin Solid Films, 1978