Error budget analysis of the SCALPEL(R) mask for sub-0.2 μm lithography
- 1 November 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 13 (6) , 2483-2487
- https://doi.org/10.1116/1.588378