Advanced silver-based metallization patterning for ULSI applications
- 31 March 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 55 (1-4) , 383-388
- https://doi.org/10.1016/s0167-9317(00)00471-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Reactive ion etch of patterned and blanket silver thin films in Cl2/O2 and O2 glow dischargesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999
- Chemical and morphological changes on silver surfaces produced by microwave generated atomic oxygenJournal of Vacuum Science & Technology A, 1994
- Morphological changes in silver foil in microwave generated oxygen and argon plasmasJournal of Vacuum Science & Technology A, 1991