Beam alignment for scanning beam interference lithography
- 1 November 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (6) , 3071-3074
- https://doi.org/10.1116/1.1523402
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Image metrology and system controls for scanning beam interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Digital heterodyne interference fringe control systemJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- Beam steering system and spatial filtering applied to interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Sub-100 nm metrology using interferometrically produced fiducialsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999