Optimization of partially coherent optical system for optical lithography

• 1 November 1992
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 10  (6) , 3004-3007
• https://doi.org/10.1116/1.585960

Abstract

Keywords

• OPTICAL LITHOGRAPHY
• OPTIMIZATION
• COHERENT OPTICAL SYSTEM
• PARTIALLY COHERENT OPTICAL