A compliant end-effector for microscribing
- 1 January 2005
- journal article
- Published by Elsevier in Precision Engineering
- Vol. 29 (1) , 86-94
- https://doi.org/10.1016/j.precisioneng.2004.05.006
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Arrays of Chemomechanically Patterned Patches of Homogeneous and Mixed Monolayers of 1-Alkenes and Alcohols on Single Silicon SurfacesAngewandte Chemie International Edition in English, 2002
- Formation of (Functionalized) Monolayers and Simultaneous Surface Patterning by Scribing Silicon in the Presence of Alkyl HalidesChemistry of Materials, 2001
- A New Method of Preparing Monolayers on Silicon and Patterning Silicon Surfaces by Scribing in the Presence of Reactive SpeciesLangmuir, 2001
- A parallel link end effector for scanning electrical discharge machining processPrecision Engineering, 1998
- A compliant end-effector coupling for vertical assembly: design and evaluationRobotics and Computer-Integrated Manufacturing, 1997
- Ductile-Regime Grinding: A New Technology for Machining Brittle MaterialsJournal of Engineering for Industry, 1991