Dissociative Diffusion Limiting Process in Silicon and Germanium

• 1 December 1973
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 12  (12) , 1956-1957
• https://doi.org/10.1143/jjap.12.1956

Abstract

Keywords

• SILICON AND GERMANIUM
• DISSOCIATIVE DIFFUSION
• PROCESS IN SILICON
• DIFFUSION LIMITING PROCESS