A high-repetition-rate chemical HF laser
- 1 April 1973
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 9 (4) , 496-497
- https://doi.org/10.1109/jqe.1973.1077503
Abstract
An HF chemical laser with a 10-cm-long active volume has been constructed for operation at high pulse repetition rates using TE excitation. Up to 7.2 W of quasi-CW power were produced at 1100 Hz. Powers as high as 160 mW were obtained on a single transition when the cavity was line tuned. The effect of sequential or cascade lasing was observed.Keywords
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