Chemical vapor deposition: Numerical models applied to transport of Ge by GeI4 and GeI2
- 24 July 1982
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 58 (2) , 354-364
- https://doi.org/10.1016/0022-0248(82)90283-4
Abstract
No abstract availableKeywords
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