Chemical vapour deposition of ZrO2 thin films monitored by IR spectroscopy
- 1 January 1994
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry
- Vol. 4 (12) , 1815-1819
- https://doi.org/10.1039/jm9940401815
Abstract
Thin films of ZrO2 have been grown under kinetic control by decomposition of zirconium tetra-tert-butoxide onto quartz substrates. The resulting films have been characterised by optical and electron microscopy and X-ray diffraction. A phase transition from a poorly crystalline, metastable form of zirconia to the monoclinic phase showing a strong preferred orientation takes place as the substrate temperature is raised from 450 to 500 °C. The decomposition of the precursor has been followed by ex situ infrared spectroscopy, allowing monitoring of the gas-phase products as a function of substrate temperature. The possible mechanism for the decomposition reaction is discussed.Keywords
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