High-quality InP surface corrugations for 1.55 μm InGaAsP DFB lasers fabricated using electron-beam lithography

30 September 1982

journal article
Published by Institution of Engineering and Technology (IET) in Electronics Letters

Vol. 18 (20) , 863-865
https://doi.org/10.1049/el:19820586

Abstract

Second-order surface corrugations for 1.55 μm distributed feedback (DFB) lasers have been fabricated in InP with a high yield using electron beam exposed resist masks. Attractive features of this technique are its flexibility and variable mark/space ratio (for optimum DFB coupling strength). Diffraction experiments show these gratings to be of suitably high optical quality.

Keywords

INP SURFACE CORRUGATIONS
VARIABLE MARK/SPACE RATIO
SEMICONDUCTOR JUNCTION LASERS
INGAASP DFB LASERS
OPTICAL FIBRE COMMUNICATION LASERS
1.55 MICRON LASER
ELECTRON-BEAM LITHOGRAPHY
FABRICATION
SECOND ORDER SURFACE CORRUGATIONS
DIFFRACTION GRATINGS

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