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Vapour-grown 1.3 μm InGaAsP/InP avalanche photodiodes
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Vapour-grown 1.3 μm InGaAsP/InP avalanche photodiodes
Vapour-grown 1.3 μm InGaAsP/InP avalanche photodiodes
GO
G.H. Olsen
G.H. Olsen
HK
H. Kressel
H. Kressel
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1 March 1979
journal article
Published by
Institution of Engineering and Technology (IET)
in
Electronics Letters
Vol. 15
(5)
,
141-142
https://doi.org/10.1049/el:19790100
Abstract
A novel planar InGaAsP/InP avalanche photodiode structure prepared by vapour-phase epitaxy is described. Avalanche gain up to 20 at 1.3 μm and at reverse breakdown of 65 V has been measured.
Keywords
65 V REVERSE BREAKDOWN
VPE
PLANAR STRUCTURE
INGAASP/INP AVALANCHE PHOTODIODES
20 AVALANCHE GAIN
1.3 MICRON ILLUMINATION
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