The structure of thin Ni-Fe films
- 1 July 1973
- journal article
- other
- Published by Taylor & Francis in Philosophical Magazine
- Vol. 28 (1) , 231-236
- https://doi.org/10.1080/14786437308217446
Abstract
The structure of Ni-Fe films 200-250 A thick deposited on amorphous SiO2 surfaces has been examined by electron microscopy and X-ray diffraction techniques. These films are found to be significantly different from similar films deposited on crystalline substrates. Specifically, these films on amorphous surfaces are characterized by complete continuity at relatively lower thicknesses, and appear to have a low-dislocation post-continuity stage.Keywords
This publication has 14 references indexed in Scilit:
- The preparation and properties of magnetoresistive permalloy filmsJournal of Electronic Materials, 1973
- Physical cluster mechanics: Statics and energy surfaces for monatomic systemsAdvances in Physics, 1971
- Influence of Deposition Parameters on the Coalescence Stage of Growth of Metal FilmsJournal of Applied Physics, 1968
- Influence of Electric Field on the Growth of Thin Metal FilmsJournal of Applied Physics, 1966
- The formation of imperfections in epitaxial gold filmsPhilosophical Magazine, 1966
- The nucleation, growth, structure and epitaxy of thin surface filmsAdvances in Physics, 1965
- The growth and structure of gold and silver deposits formed by evaporation inside an electron microscopePhilosophical Magazine, 1964
- Defects in silver films prepared by evaporation of the metal onto micaPhilosophical Magazine, 1962
- Etudes de la structure de raies de diffraction des rayons X par des couches minces d'orActa Crystallographica, 1962
- Microtwinning in epitaxial nickel-iron filmsPhilosophical Magazine, 1960