Reactions of alkoxysilanes on metal oxide surfaces: decomposition of tetraethoxysilane on MgO(100) and Al2O3(0001)
Open Access
- 1 December 1993
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 72 (4) , 409-417
- https://doi.org/10.1016/0169-4332(93)90378-o
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Pathways and intermediates in the reaction of tetraethoxysilane on silicon(100)-2 .times. 1Langmuir, 1993
- Acid-base properties of model magnesium oxide surfacesLangmuir, 1991
- An HREELS investigation of the adsorption and reaction of formic acid on the (0001)-Zn surface of ZnOSurface Science, 1991
- The pyrolysis of tetraethoxysilane over carbon and silica substratesJournal of Analytical and Applied Pyrolysis, 1989
- Thermal and photon induced reactions of CH3CH2OH on Si(111)7×7Surface Science, 1988
- Chemical structure of ultrathin thermally grown oxides on a Si(100)-wafer using core level photoemissionSurface Science, 1987
- High resolution electron energy loss spectroscopy of insulatorsJournal of Electron Spectroscopy and Related Phenomena, 1986
- Vibrational study of the SiO2/Si interface by high resolution electron energy loss spectroscopyJournal of Vacuum Science & Technology B, 1985
- Initial stages of oxidation of Si{100}(2 × 1): A combined vibrational (EELS) and electron binding energy (XPS) studySurface Science, 1985
- Application of Fourier transform techniques to deconvolution of HREEL spectraSurface Science, 1985