Metal deposition by electron beam exposure of an organometallic film
- 23 June 1986
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 48 (25) , 1748-1750
- https://doi.org/10.1063/1.96823
Abstract
We describe a method of metal deposition by electron beam exposure and pyrolysis of a gold containing organometallic polymer. Commercial gold containing solutions were used as negative electron beam resists with line dose sensitivities of about 0.2 μC/cm as developed in methylene chloride. We have demonstrated the formation of metal patterns on Si, GaAs, and polyimide with linewidths as small as 0.25 μm.Keywords
This publication has 3 references indexed in Scilit:
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- A review of laser–microchemical processingJournal of Vacuum Science & Technology B, 1983