Exposure of Photoresists
Open Access
- 1 January 1970
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 117 (12) , 1555-1556
- https://doi.org/10.1149/1.2407382
Abstract
Less energy is required to solubilize AZ‐1350 when the exposure is accomplished with kilovolt electrons than when light is used to expose the photoresist. In contrast to overexposure with light, overexposure by electrons causes an insoluble cross‐linked product to form. The solubilization reaction is enhanced by the addition of small amounts of benzotriazole, indazoles, and imidazoles, while the cross‐linking reaction is inhibited by these additives.Keywords
This publication has 0 references indexed in Scilit: