Trilevel lift-off process for refractory metals

• 1 May 1982
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science and Technology
• Vol. 21  (1) , 33-35
• https://doi.org/10.1116/1.571731

Abstract

Keywords

• THIN FILM
• ELECTRON MICROSCOPY
• HIGH RESOLUTION
• CRITICAL TEMPERATURE
• SUPERCONDUCTORS