Hydrogen-atom assisted CVD of copper at low temperatures and in-situ gas-phase spectroscopy studies
- 1 June 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 262 (1-2) , 39-45
- https://doi.org/10.1016/0040-6090(95)05833-8
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Copper deposition and thermal stability issues in copper-based metallization for ULSI technologyMaterials Science Reports, 1992
- Tungsten film deposition by hydrogen atom reaction with WF6Journal of Vacuum Science & Technology A, 1991