Characterization of chemically assisted ion beam etching of InP

• 1 November 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (6) , 3317-3321
• https://doi.org/10.1116/1.587619

Abstract

Keywords

• ANISOTROPY
• ARGON
• ION BEAM
• ROUGHNESS
• MORPHOLOGY
• MATERIALS SCIENCE
• ETCHING